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ITO薄膜的半导化机理、用途和制备方法
Semiconducting Mechanism, Aplications and Fabrication of ITO Films
【摘要】 综述了ITO薄膜的半导化机理、应用和制备工艺。ITO薄膜的半导化机制是高价Sn4+替代部分In3+和氧缺位。ITO薄膜主要用于光电器件中,例如用于液晶显示。综述了磁控溅射、CVD、喷雾热分解和溶胶-凝胶四种制膜工艺。
【Abstract】 The semiconducting mechanism, applications and fabrication techniques ofITO films are reviewed. The semiconducting mechanism of ITO is attributed to doping with Sn4+ and to oxygan vacancies. The semiconducting transparent ITO films are mainly used in optical-electrical devices such as LCD (liquid crystal display) device. Various fabrication techniques cur-rently in use, including magnetron sputtering, CVD, sol-gel, spray-pyrolysis, are discussed.
【关键词】 ITO薄膜;
半导化;
应用;
制备工艺;
【Key words】 ITO films; semiconducting; application; fabrication technique;
【Key words】 ITO films; semiconducting; application; fabrication technique;
- 【文献出处】 材料导报 ,Materials Review , 编辑部邮箱 ,1997年04期
- 【分类号】TB43
- 【被引频次】94
- 【下载频次】1071