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不同厚度GaAs覆盖层对自组织生长InAs量子点退火效应的影响
Annealing Effects of Self-Assembled InAs Quantum Dots With Different Thick GaAs Cap Layers
【摘要】 本文利用光致发光测量了不同厚度GaAs覆盖层对自组织生长InAs量子点退火效应的影响.退火使量子点发光峰蓝移,发光强度减弱.深埋的量子点承受更大的应变,应变使退火引起的互扩散加强.GaAs盖层越厚,量干点的互扩散越明显,发光峰蓝移越显著,并由此导致了发光峰半高宽的不同变化.
【Abstract】 We investigate the annealing effects of photoluminescence (PL) from self-assembled InAs quantum dots (QDs) with different thick GaAs cap layers. Annealing Induces a blue-shift of the QD PL peak, and a decrease of the intensity. A deeper buried dot will experience a larger strain, and the strain of QDs enhances the interdiffusion. This results in a larger blue-shift of the deeper buried QDs, and a different variance of the half width of PL peak from QDs with different thick cap layers.
【基金】 国家自然科学基金;国家攀登计划资助
- 【文献出处】 半导体学报 ,CHINESE JOURNAL OF SEMICONDUCTORS , 编辑部邮箱 ,1997年09期
- 【分类号】TN304
- 【被引频次】7
- 【下载频次】63