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硅片高温翘曲与常温机械强度
Warpage at High Temperature and Mechanical Strength of Silicon Wafers
【摘要】 不同抗弯强度硅片高温弯曲度变化的实验结果表明,众多因素对抗弯强度和高温弯曲度的影响规律是一致的.高温翘曲度或弯曲度与抗弯强度有内在联系.抗弯强度不仅表示硅片在常温下的抗破碎能力,而且也反应了高温抗翘曲和弯曲能力.
【Abstract】 The relationship of the warpageat at high temperature and fie-cure strength of silicon wafers is studied by measurement of fie-cure strength and change of bowingness of silicon wafers after heat treatment. The laws of effect of various factors on warpage and fie-cure strength of silicon wafers are all the same. The fie-cure strength of silicon wafer can reflect its ability of anti-warping or bowing at high temperature to a certain degree.
【基金】 国家教委硅材料重点实验室基金
- 【文献出处】 半导体学报 ,CHINESE JOURNAL OF SEMICONDUCTORS , 编辑部邮箱 ,1997年09期
- 【分类号】TN405
- 【被引频次】10
- 【下载频次】250