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硅片高温翘曲与常温机械强度

Warpage at High Temperature and Mechanical Strength of Silicon Wafers

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【作者】 谢书银; 石志仪; 陈忠祥; 张维连;

【Author】 Xie Shuyin;Shi Zhiyi and Chen Zhongxiang(Central South University of Technology, Department of Applied Physics and Heat Engineering, Changsha 410083)Zhang Weilian(Hebei University of Technology, Tianjin 300130)Received 23 July 1996 f revised manuscript re

【机构】 中南工业大学应用物理与热能工程系!长沙; 410083; 河北工业大学半导体材料研究所!天津; 300130;

【摘要】 不同抗弯强度硅片高温弯曲度变化的实验结果表明,众多因素对抗弯强度和高温弯曲度的影响规律是一致的.高温翘曲度或弯曲度与抗弯强度有内在联系.抗弯强度不仅表示硅片在常温下的抗破碎能力,而且也反应了高温抗翘曲和弯曲能力.

【Abstract】 The relationship of the warpageat at high temperature and fie-cure strength of silicon wafers is studied by measurement of fie-cure strength and change of bowingness of silicon wafers after heat treatment. The laws of effect of various factors on warpage and fie-cure strength of silicon wafers are all the same. The fie-cure strength of silicon wafer can reflect its ability of anti-warping or bowing at high temperature to a certain degree.

【基金】 国家教委硅材料重点实验室基金
  • 【文献出处】 半导体学报 ,CHINESE JOURNAL OF SEMICONDUCTORS , 编辑部邮箱 ,1997年09期
  • 【分类号】TN405
  • 【被引频次】10
  • 【下载频次】250
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