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溅射法制备硫化锌薄膜的XPS剖析
A new method for design of CCD driving circuit
【摘要】 用X射线光电子能谱(XPS)技术,测量了射频磁控溅射法(RFMS)制备的硫化锌薄膜(ZnS:Er3+)的表面及内部构态,认为氧吸附形成的表面构态是产生薄膜界面态和界面陷阱能级的主要原因,对研究器件的激发过程有参考意义。
【Abstract】 Three schemes for previous design of CCD driving circuit are discussed in detail,followed by analysis of their advantages and disadvantages.A new design method with simple and easy implementation is proposed.A practical design of TCD1200D driving circuit using this method is given as an example.
【关键词】 半导体薄膜;
硫化锌;
X射线光电子能谱;
射频磁控溅射;
【Key words】 CCD; Driving Circuit; Monolithic Microcomputer; GAL;
【Key words】 CCD; Driving Circuit; Monolithic Microcomputer; GAL;
【基金】 福建省自然科学基金
- 【文献出处】 半导体光电 ,SEMICONDUCTOR OPTOELECTRONICS , 编辑部邮箱 ,1997年04期
- 【分类号】O472
- 【被引频次】5
- 【下载频次】161