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S枪磁控溅射镍薄膜温度传感器
S-Gun Magnetron Sputtered Ni Thin Film Temperature Sensors
【摘要】 本文分析了薄膜温度传感器制造的难点,提出降低内应力的方法,应用正交试验技术得出了最佳工艺条件,应用S枪磁控溅射方法和薄膜工艺制成了零电阻分别为100Ω、500Ω、1000Ω的镍薄膜电阻元件,其电阻温度系数达到德国DIN43760标准.
【Abstract】 The key points and difficulties in making thin film temperature sensors are analysed and a method to reduce internal stress is proposed in this paper. Optimal process is obtained by applying the orthogonal experimental technique. Ni thin film temperature sensors with different zero resistance (100, 500 and 1,000 ohm) consistent with the German DIN 43760 Standard are realized through S-gun magnetron sputtering and thin film processes.
- 【文献出处】 仪表技术与传感器 ,Instrument Technique and Sensor , 编辑部邮箱 ,1996年02期
- 【分类号】TP212
- 【被引频次】5
- 【下载频次】125