【摘要】 简要介绍了自制的聚焦离子束（ＦＩＢ）系统中束着靶点的飘移现象，分析引起飘移的原因及所采取降低飘移的措施。用此ＦＩＢ进行了一些基本图形的刻蚀研究，讨论了束流密度分布对溅射刻蚀线条宽度的影响。最后介绍了用ＦＩＢ制作光电集成电路的谐振腔面和耦合腔的一些经验。更多还原

【Abstract】 The beam drift phenomenon in the focused ion beam(FIB) system made byourselves are briefly introduced and the factors causing the drift amd measures toreduce the drift are discussed. Then we described the experimental study of theFIB etching fabrication for some basic graphes. The effect of the beam currentdensity distribution upon the etched line width is discussed. In the end,someexperiences to fabricate the output mirror of ridge wave guide GaAs/GaA1Asquantum wells laser and the coupled-cavity of GaAs/GaA1As multiple quantumwells wave guide modulator/laser monolithically integrated light source by FIBsputter-etching are given.更多还原