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热丝CVD在涂巴基管硅基片上沉积大面积金刚石膜

Synthesis of Large Area Diamond Films on Silicon Substrates Coated by Buckytube using HFCVD

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【作者】 曾效舒高志栋梁吉魏秉庆吴德海

【Author】 Zeng Xiaoshu Gao Zhidong Liang Ji Wei Bingqin Wu Dehai (Department of Mechanical Engineering,Tsinghua University,Beijing 100084,China)

【机构】 清华大学机械工程系

【摘要】 本文采用多排热丝化学气相沉积法在涂巴基管的硅基底上沉积金刚石膜,研究了金刚石膜的生长面积和质量均匀性。实验结果表明,随着热丝数量增加,金刚石膜的面积增加;随着丝底距增加和真空度提高,金刚石膜的质量均匀性提高。利用多排热丝和间歇转动工作台,在涂巴基管的单晶硅基底上沉积出了30×60mm、质量均匀的金刚石薄膜。扫描电镜和拉曼光谱检测确认了这一结果。

【Abstract】 The diamond films with large area were grown on the buckytube coated silicon substrate by vsing hot filament chemical vapor deposition technique.The influences of several deposition parameters on the area and homogenity of the diamond films were studied.30×60mm in area diamond film was deposited,through using five rows of filaments and turning intermittently holder.The properties of the diamond films were examined by using scanning electron microscope and Raman spectroscoe.

【关键词】 金刚石膜热丝法巴基管化学气相沉积
【Key words】 diamond filmhot filamentsbuckytubeCVD
  • 【文献出处】 人工晶体学报 ,JOURNAL OF SYNTHETIC CRYSTALS , 编辑部邮箱 ,1996年04期
  • 【分类号】P619.243
  • 【被引频次】8
  • 【下载频次】69
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