节点文献
用XPS法研究硫化锌薄膜
Investigation of Zinc Sulfide Thin Film with XPS Analysis Method
【摘要】 运用XPS法研究ZnS:Cu,Cl,Er薄膜器件的界面态及所掺激活剂的纵向分布,认为氧吸附形成的ZnS薄膜的表面构态是产生薄膜界面态和界面陷阱能级的主要原因,对研究薄膜器件的激发过程有参考意义。
【Abstract】 The interface states in ZnS:Cu,Cl,Er thin film and the longitudinal distribution of the activators doped in the film are investigated with XPS analysis method in this paper.It is considered that the surface structure states fromed by oxygen absorption are the main cause of inducing interface states and energy levels of interface traps.The results are referable in study of the electroluminescent excitation process of the thin film devices.
【基金】 福建省自然科学基金
- 【文献出处】 固体电子学研究与进展 ,RESEARCH & PROGRESS OF SOLIA STATE ELECTRONICS , 编辑部邮箱 ,1996年03期
- 【分类号】O484
- 【被引频次】7
- 【下载频次】128