【摘要】 本文研究了纯铜的气体表面渗硅新工艺，也即在含硅气氛下低温沉积和扩散表面改性的工艺研究情况，介绍了各实验参数对渗硅层厚度和性能的影响更多还原

【Abstract】 In this paper, the new technique of surface gas siliconize on copper was researached, it is a kind of surface modification in silication in silicating atmosphere. The influence of various experimental parameters on depth and properties of siliconize layer were also introduced.更多还原