节点文献
锗硅材料在微电子、光电子方面的应用
Application of GeSi Material In the Micro Electron and Photoelectron
【摘要】 锗硅材料的制造与硅平面工艺相容,且具有优良的电学、光学性能,被称为“第二代硅微电子技术”。在高速异质结双极型晶体管(HBT)、调制掺杂场效管中获得应用,其中HBT即将走向产业化,锗硅材料具有能带可调的特性,在光电子方面有其应用价值,锗硅材料做红外探测器有诱人的前景。
【Abstract】 In this paper, the properties of the GeSi material was summarized. It has exellent electronic、optical properties, and was compatible with silicon faced process. So GeSi material was named as “the second silicon microelectric technology”. It was applied to hetrojunction bipolar transistor、modulate doped field effect transistor because of its high mobility. It was utilized to made infrared dectector for its optical property.
- 【文献出处】 材料科学与工程 ,MATERIALS SCIENCE AND ENGINEERING , 编辑部邮箱 ,1996年03期
- 【分类号】TN304.11
- 【被引频次】4
- 【下载频次】291