节点文献
MOCVD和GSMBE生长Ga0.5In0.5P外延层中有序结构的研究
Ordered Structure in Ga0.5In0.5P Grown by MOCVD and GSMBE
【摘要】 用MOCVD在(100)、GSMBE在(100)和(111)BGaAs上生长了GaInP外延层.PL测试表明,(100)衬底上GaInPPL峰的能量比计算的带隙分别小43(GSMBE生长)和104meV(MOCVD生长).用Kurtz等人的模型对MOCVD和GSMBE生长的GaInP中有序度的不同进行了解释.并讨论了衬底晶向对GaInP中有序程度的影响.
【Abstract】 Abstract GaxIn1-xP(x≈0.51)epilayers grown on(100)GaAs by MOCVD and on(100)and (111)B by GSMBE were characterized by X-ray diffraction and photoluminescence (PL). The 10K PL spectra show that PL peak energies of GaInP on(100) grown by MOCVD and GSMBE are smaller than the band gaps by 104 and 43 meV, respectively, indicating the ordering in the GaInP.This results are explained on the basis of the model proposed by Kurtz et al..Finally,we also discuss the possibilities of ordering in GaInP on differently oriented GaAs substrates and arrive at the conclusion that the GaInP grown on(111) GaAs is always disordered.
- 【文献出处】 半导体学报 ,CHINESE JOURNAL OF SEMICONDUCTORS , 编辑部邮箱 ,1996年09期
- 【分类号】TN304.045
- 【被引频次】3
- 【下载频次】53