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Zn扩散工艺在降低VCSELp型DBR串联电阻中的应用
Application of Zn diffusion in reducing the series resistance of p-DBR of VCSEL
【摘要】 垂直腔面发射激光器P型λ/4分布布喇格反射镜由于在AlAs/Al0.1Ga0.9As材料λ/4堆积层界面处存在大的势垒差,使得p型DBR串联电阻很大。文章报道一种利用Zn扩散工艺,使AlAs/Al0.1Ga0.9Asλ/4堆积层Al,Ga互扩散,形成AlxGa1-xAs混熔层或在界面处形成Al,Ga组分渐变的AlxGa1-xAs缓变层,从而降低p型DBR串联电阻的方法。利用这种方法,已研制成功室温连续工作的垂直腔面发射激光器
【Abstract】 Due to the differences of the potential barriers at AlAs/Al 0.1 Ga 0.9 As hetero-interfaces of λ /4 stack layer in p-type λ /4 distributed Bragg reflector (p-DBR) of vertical cavity surface emitting lasers(VCSELs),p-DBR has very large series resistance.A method to reduce this series resistance by Zn diffusion is reported,which is that Al,Ga inter-diffusion in AlAs/Al 0.1 Ga 0.9 As λ /4 stack layer is carried out to form Al x Ga 1- x As mixed-melted layer,or to form Al x Ga 1- x As graded layer with Al,Ga component grading at the interface.By use of this method,room temperature CW VCSELs are successfully developed.
【Key words】 Semiconductor Devices; Vertical Cavity Surface Emitting Lasers; Distributed Braga Reflectors; Diffusion;
- 【文献出处】 半导体光电 ,SEMICONDUCTOR OPTOELECTRONICS , 编辑部邮箱 ,1996年03期
- 【分类号】TN305.4
- 【被引频次】1
- 【下载频次】87