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TIN_x薄膜的特性和俄歇电子能谱分析

Characteristics of TiN_x Film and Analysis by Auger Electron Spectroscopy

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【作者】 刘必荣

【Author】 Liu Birong(Depatment of Physics, Anhui University, Hefei)T. Telemen(Institute of Materials Research, Bern, CH-3010)

【机构】 安徽大学物理系瑞士材料研究所

【摘要】 采用不同工艺,在Fe基上气相沉积TINx薄膜。通过扫描电镜,划痕仪,俄歇电子能谱,粘着力测量仪的观测,分析和计算,给出了膜的形貌,组份,光学特性和力学特性。发现随着TINx膜中组分及其氧含量的变化,膜的颜色,粘着力,TINx膜的均匀性都发生显著的变化。本文还采用一种与文献不同的方法,较为简便地处理了俄歇谱中Ti和N峰的重造现象。

【Abstract】 Abstract Using different process, we have fabricated the TiNx thin films on Fe by Vapor Depositionmethod. The TiN. films have been done the observation, analysis and computation employing delimitation mark device, SEM, AES and device of adhesion measuring. We have obtained the morphology photographs, composition, optical and mechanical characteristics of TiN. films and discovered that the TiN. film’s colour,adhesion and uniformity change notably with composition and oxygen element content in the TiN. films.In this’ paper, we have handily dealed with overlaping phenomenon between Ti and N peakson Auger electron spectra by using a different method from the documents.

【关键词】 沉积俄歇粘着力
  • 【分类号】TN152.1
  • 【被引频次】4
  • 【下载频次】126
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