【摘要】 阐述了X射线镂空硅掩模的研制及其在同步辐射深层光刻中的应用。在北京同步辐射国家实验室X射线光刻装置上，采用本文研制的X射线镂空硅掩模获得胶厚为30～40μm、侧壁很陡、边缘很直的X射线深层光刻胶图形。更多还原

【Abstract】 The fabrication of X-ray stencil silicon mask and its application in X-ray deep lithography are presented in this paper. Special X-ray stencil silicon mask with excellent patterns of high contrast for shorter wavelength soft X-ray has been developed in our laboratory, which is found to be suitable for X-ray deep lithography experiments. Using such kind of X-ray stencil silicon mask,structured patterns of resist as thicker than 30μm with vertical side-walls and good edge profile have been obtained on the X-ray lithography appara- tus of the Beijing synchrotron radiation facility, BEPC national laboratory.更多还原