【摘要】 本文将报导我们编制相移掩模模拟软件的有关工作，分析其中几个重要参数的影响，同时在非相干，部分相干，以及相干光照明下对曝光线条边角的圆化建立了数学模型，并与实验结果加以比较。更多还原

【Abstract】 In the paper we will report some work on the programming of phase shiftmask(PSM)simulation software, Some important parameters will be analyzed.In the meanwhile, we set up the mathematical models for studying roundingcharacteristics of ilnaging of the bar patterns under the project lithography sys-tem with incoherent,partial coherent and coherent illumination. The theoreticalresults are compared to the experimental results.更多还原