【摘要】 采用低衬底温度射频溅射的方法制得了低电阻率、高透过率的透明导电膜，沉积时的氧分压、衬底温度等对透明导电膜有很大的影响．衬底温度为室温时，制出了４．５×１０－４Ω·ｃｍ的透明导电膜．在彩色滤色膜或保护膜上沉积透明导电膜时，只能在低于它们的耐热温度以下，并注意排除有机膜吸附的气体．更多还原

【Abstract】 Thansmittance Conductive Oxide (TCO) films were deposited by RF sputtering using indium tin chide targets. Low resistivity of 3.5×10-4Ω·cm was obtained under optimum conditions, depending on oxygen partial pressure and substrate temperature. When TCO films are deposited on color filter or protective films, the substrate temperatures have to be controlled below the highest thermal resistance temperature of color filter or protective films, and adhesive gases have to be expeled from colour filter or protective films.更多还原