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铁基体等离子体增强磁控溅射离子镀Ti-TiN涂层的组织结构
Microstructures of Ti-TiN Coating Deposited on iron Substrate by Plasma Enhanced Magnetron Sputtering Ion Plating
【摘要】 利用等离子体增强磁控溅射离子镀(PEMSIP),先在铁基体上镀一层很薄的钛中间层,继之沉积TiN。对膜层进行俄歇电子能谱(AES)分析和透射电镜(TEM)分析。结果表明,膜与基体之间有厚约50nm的过渡层;膜基界面处有FeTi相;中间层与后继膜交接处Ti2N与α-Ti有取向关系。
【Abstract】 A thin Ti layer was first coated as an intermediate layer on the iron substrate,and then followed by TiN layer by means of plasma enhanced magnetron sputtering ion plating. The coatings have been investigated by means of Auger electron petroscopy(AES)and transmission electron micraseopy (TEM). The results indicate that there exists a transition layer with a thickness of about 50nm in the interface between the coating and the substrate, and there is FeTi phase in the interface.The crystallographic orientation relationship between a-Ti and Ti2N in the contacting area of Ti intermediate layer with the following TiN coating has been observed.
【Key words】 plasma enhance; magnetron sputtering; transition layer; TiN; FeTi;
- 【文献出处】 金属热处理学报 ,TRANSACTIONS OF METAL HEAT TREATMENT , 编辑部邮箱 ,1995年02期
- 【分类号】TG162.8
- 【被引频次】3
- 【下载频次】116