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新型辉光放电渗铝源

A Nexv Type of A luminium Supply Source Aimed for Ion Aluminizing

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【作者】 高原贺志勇徐重

【Author】 Gao Yuan;He Zhiyong;Xu Zhong(Research Instittite of Suface Engineering,Taiyuan University of Technology)

【机构】 太原工业大学表面工程研究所

【摘要】 新型辉光放电渗铝源高原,贺志勇,徐重(太原工业大学表面工程研究所)1前言传统的离子渗铝方法是将铝放入石墨坩锅内作为供给源。因渗铝温度高于铝的熔点(约660℃).铝呈液态。从而坩锅的摆放位置受到限制,且由于渗铝时铝液处于沸腾状态,试样与铝液距离较近时,...

【Abstract】 A new type of aluminiu supply source is developed for the purpose of ionalum inizing by Xu-Tec process. Making use of the method of powder metallurgy , theuniform mixture of aluminium and graphite powders is isostatic pressed and sintered to formthe source, Due to the high strength at the alumin izing temperature, the source can beinstalled both vertically and horizontally, ensuring the convenience of practical application.The ion aluminizing experiments under the glow discharge condition of the Xu-Tec proceseare carried out. The procex:shows high efficiency, and the supply of aluminium is provedto be adequate and Well-distributed.The aluminizing layer can be formed partly or entirelyon the specimen,and the surface quality remains fine.

  • 【文献出处】 金属热处理学报 ,TRANSACTIONS OF METAL HEAT TREATMENT , 编辑部邮箱 ,1995年01期
  • 【分类号】TG156.86
  • 【被引频次】7
  • 【下载频次】43
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