【摘要】 对铁电薄膜热处理过程中产生的裂纹的特性进行了分析。通过实验，研究了裂纹与铁电薄膜微细图形的尺寸、图形形状，以及衬底材料的关系，确定了铁电薄膜无裂纹设计规则及无裂纹工艺。更多还原

【Abstract】 he cracks in ferroelectric films after annealing are studied.P(L)ZT ferroelectric filmshave been grown on different substrates respectively,such as Si , SiO2/Si,Si3N4/Si or Pt/Ti/SiO2/Si.Based on experimental results,it is proved that the appearance of the cracks isassociated with not only the substrate material, but also the shape of the film pattern,Toobtain crack-free films,the film pattern should be prepared before annealing and the area ofthe film pattern should be as small as possible.A“bottleneck”should be designed so as toprevent cracks from extending into the film.更多还原