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用光电导研究不同厚度未掺杂MOCVDGaAs外延层自由激子
INVESTIGATION OF FREE EXCITONS IN UNDOPED MOCVD GaAs EPITAXIAL LAYER OF DIFFERENT THICKNESSES BY PHOTOCONDUCTIVITY
【摘要】 用光电导测定厚度为4~30μm的未掺杂GaAsMOCVD外延层中自由激子跃过特性.发现当外延层厚度增加时,结合能Rx增大,n=1自由激子峰位略向低能区漂移,而激子的高激子态强度和寿命τ都减小,这些效应主要归因于外延层表面的缺陷和电场的作用,最后,讨论了光致发光结果和测量温度对它的影响.
【Abstract】 he properties of the free-exciton transitions in undoped MOCVD GaAs epitaxial layer of thicknesses varying from 4 to 30 Urn were determined by using the photoconductivity measurements.It was found that as the thickness is increased,the binding energy R.increases,and the free exciton peak for n=1 shifts slightly towards lower energies,but both the intensity of the higher excitonic levels and the lifetime T of the excitons decrease.These effects were attributed mainly to the defects and electrical field near the surface of the epilayer.Finally,the photoluminescence results and the influence of the measurement temperature on them were also discussed.
【Key words】 GaAs epitaxial layer; free exciton; photoconductivity; photoluminescence.;
- 【文献出处】 红外与毫米波学报 ,JOURNAL OF INFRARED AND MILLIMETER WAVES , 编辑部邮箱 ,1995年04期
- 【分类号】O734
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