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Al栅a-Si TFT栅绝缘膜研究

Gate Insulator of Al Gate a-Si TFT

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【作者】 熊绍珍谷纯芝李峻峰周桢华孟志国代永平张建军丁世斌赵颖

【Author】 Xiong Shaozhen; Gu Chunzhi; Li Junfeng; Zhou Zhenhua;Meng Zhiguo; Dai Yongping; Zhang Jianjun; Ding Shibin; Zhao Ying (Institute of Photoelectronic Thin Film Devices and Technology,Nankai University,Tianjin, 300071)

【机构】 南开大学!天津300071

【摘要】 Al栅可明显降低AM-LCD中a-SiTFT矩阵的栅总线电阻及栅脉冲信号延迟,有利于提高高密显示屏的开口率与图像质量。本文详细介绍了Al栅的阳极氧化技术,获得了适于a-SiTFT复合栅的Al2O3栅绝缘材料。

【Abstract】 Al gate can obviously reduce total gate-line resistance and gate-pulse delay of a-Si TFT matrix used in AM-LCD. It is profitable for increasing the aperture ratio and image quality of high-information-content display screen. The anodized technology of Al gate is discussed in detail. A high quality gate insulator Al2O3 with good electric characteristics has been obtained,which is satisfied for the double-gate insulator a-Si TFT.

  • 【文献出处】 光电子技术 ,Optoelecfronic Technology , 编辑部邮箱 ,1995年02期
  • 【分类号】TN1
  • 【被引频次】8
  • 【下载频次】105
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