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重掺杂硅物理参数的低温特性分析
Analysis of the Low Temperature Characteristics of Physical Parameters in the Heavily Doped Silicon
【摘要】 本文考虑了杂质重掺杂引起的禁带变窄效应,提出了新的电离率和有效多数载流子浓度的数学模型,并应用于由发射效率决定的硅双极晶体管电流增益的计算,所获得的计算结果与实验相符合。这为硅低温半导体器件的设计提供了理论基础。
【Abstract】 Under the consideration of the bandgap narrowing effect which is resulted from the heavily doping,we propose a new mathematic temperature model for the ionized fraction and the effective majority-carrier concentration.By using this calculative model,the current gain determined by the emission efficiency in silicon bipolar transistors is derived.The obtained results are in agreement with the experimental data.This provides a beneficial basis for the design of low temperature silicon devices.
- 【文献出处】 电子学报 ,ACTA ELECTRONICA SINICA , 编辑部邮箱 ,1995年08期
- 【分类号】TN304.12
- 【被引频次】2
- 【下载频次】117