【摘要】 利用等离子体增强磁控溅射离子镀（ＰＥＭＳＩＰ）技术在铁基体上沉积ＴｉＮ涂层之前，先镀一层很薄的钛中间层，继之再沉积ＴｉＮ。研究了基片负偏压对涂层相组成的影响。结果表明，随着基片负偏压增加，膜层的相分朝着富氮相及其含量增加的方向发展，变化趋势为（α－Ｔｉ＋Ｔｉ_２Ｎ＋ＴｉＮ）→（Ｔｉ_２Ｎ＋ＴｉＮ）→ＴｉＮ。在基体与中间层界面处有ＦｅＴｉ相；在中间层与后继膜的交接处，发现α＝１与Ｔｉ_２Ｎ有取向关系。更多还原

【Abstract】 A thin Ti layer was first coated as an intermediate layer on the iron substrate and then followed by TiN layer by means of plasma enhanced magnetron sputtering ion plating. The influence of substrate negative biases on component phases of the coatings has been investigated. The results show that component phases of the coatings trends towards the formation of nitrides rich in nitrogen and the increase of its content with the increase of substrate negative bias, the variation tendency is(αTi +Ti2N+TiN)→(Ti2N+TiN)→TiN. It has been discovered in the investigation that there was a FeTi phase in the interface between the substrate and the Ti intermediate layer and discovered a crystallographic orientation relationship of the αTi phase and Ti2N Phase in the contacting area between the Ti intermediate layer and the following TiN layer.更多还原