节点文献
微波等离子体技术在高技术新材料领域的应用
The Applications of Microwave-induced Plasma Technology in High-tech Advanced Material Research
【摘要】 微波等离子体的研究已有三十多年的历史,近十年来的研究已使微波等离子体技术扎根于高技术新材料领域中。讨论了陶瓷微波等离子烧结技术、MPCVD制备金刚石薄膜和光导纤维、微波ECR制备纳米固体薄膜和微波刻蚀技术等。
【Abstract】 Microwave-induced plasma technology has developed formore than 30 years,more and more applications in high-tech advanced material research have been discovered in recent ten years. Recent developments of microwave-induced plasma sintering, diamond film and optical fibre prepared by MPCVD, nanometre scale solid film prepared by microwave ECR and microwave etching technique have been reviewed in this paper.
【关键词】 微波等离子体;
烧结;
微波等离子CVD;
纳米固体薄膜;
刻蚀;
【Key words】 microwave-induced plasma; sintering; MPCVD; nanometre scale solid film; etching;
【Key words】 microwave-induced plasma; sintering; MPCVD; nanometre scale solid film; etching;
- 【文献出处】 材料导报 ,Materials Review , 编辑部邮箱 ,1995年02期
- 【分类号】TB30
- 【被引频次】19
- 【下载频次】322