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甲酸盐型三价铬电镀液电化学研究

Electrochemical Study of Trivalent Chromium Plating Solutin Containing Formate

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【作者】 王先友蒋汉瀛

【Author】 Wang Xianyou ,Jiang Hanying (Central-South University of Technology )

【机构】 中南工业大学化学系中南工业大学化学系

【摘要】 研究了甲酸盐型三价铬镀液的电化学特性,通过循环伏安、动电位扫描、恒电位电镀、恒电流电镀证实了Cr3+在电位负于—1.3V后开始还原为Cr,在-0.9V~-1.3V之间还原为Cr2+,Cr2+是暂时的,在溶液中极不稳定.但能加速配体交换反应。讨论了Cr3+电沉积的电极过程和镀层不能加厚的原因。

【Abstract】 Electrochemical characteristics of trivalent chromium plating solution from formate was studied. By means ofcyclic voltammogram,potentiodynamic polarization,potentiostatic electroplating and galvanostatic electroplating,ithas testified that Cr3+reduce Cr after potential is more negative than-1. 3V;C3+reduce Cr2+when potential is between-0. 9~-1. 3V. Although Cr2+ is highly unsteady.it can accelerate ligand exchang processes. It has alsobeen discussed for electrode processes of trivalent chromium electroplating and the reason for the plated film cannotbe thickened.

【关键词】 电镀配体交换电极过程
  • 【文献出处】 表面技术 ,Surface Technology , 编辑部邮箱 ,1995年04期
  • 【分类号】TQ153
  • 【被引频次】22
  • 【下载频次】215
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