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氢化非晶碳化硅及其光电特性
Hydrogenated Amorphous Silicon-Carbon Film and Optoelectronic Properity
【摘要】 我们用射频辉光放电分解(CH4+SiH4)在单晶硅和玻璃衬底上制造非晶碳硅合金膜。通过红外吸收、光吸收、暗电导率和光电导率的测量给出了化学组分、光学带隙、红外光谱、暗电导率、光电导率、掺硼的影响和退火特性。
【Abstract】 Abstract Hydrogenated amorphous Silicon-Carbon alloy film has been prepared on C-Si and glass substrate by radio-frequency glowdischarge decomposition of a Silane-methane. It’s various properity, including the chemical composition,optical gap, infrared spectrum, dark and photo conductivity, boron doping effect and heat-treatment by means of infrared absorption, optical absorption,and conductivity measure.
- 【文献出处】 真空 ,VACUUM , 编辑部邮箱 ,1994年01期
- 【分类号】TB742
- 【被引频次】4
- 【下载频次】103