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氢化非晶碳化硅及其光电特性

Hydrogenated Amorphous Silicon-Carbon Film and Optoelectronic Properity

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【作者】 孙金坛邱德润

【Author】 Sun Jintan and Qiu Derun(Applied Physics Department of Hefei University of Technology)

【机构】 合肥工业大学应用物理系

【摘要】 我们用射频辉光放电分解(CH4+SiH4)在单晶硅和玻璃衬底上制造非晶碳硅合金膜。通过红外吸收、光吸收、暗电导率和光电导率的测量给出了化学组分、光学带隙、红外光谱、暗电导率、光电导率、掺硼的影响和退火特性。

【Abstract】 Abstract Hydrogenated amorphous Silicon-Carbon alloy film has been prepared on C-Si and glass substrate by radio-frequency glowdischarge decomposition of a Silane-methane. It’s various properity, including the chemical composition,optical gap, infrared spectrum, dark and photo conductivity, boron doping effect and heat-treatment by means of infrared absorption, optical absorption,and conductivity measure.

  • 【分类号】TB742
  • 【被引频次】4
  • 【下载频次】103
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