节点文献
阳极真空弧沉积装置及弧特性初步诊断
The Anodic Vacuum Arc Deposition Device and Preliminary Investigation of Arc Properties
【摘要】 介绍一种新的真空弧沉积实验装置。在15~40A的电流范围内,对A1弧等离子体的特性进行了初步诊断。在25A弧电流下,电子温度为0.4~0.8eV,电子浓度为1015~1017m-3。
【Abstract】 A new vacuum arc deposition experimental device is intreduced in this paper.The properties ofAl arc plasma generated by anodic vacuum arc are investigated preliminarily in the current rangebetween 15 and 40A. The electron temperature range is within 0.4~0.8eV and the electron densi-ty is within 1015~1017m-3 at 25A arc current.
- 【文献出处】 烟台大学学报(自然科学与工程版) ,JOURNAL OF YANTAI UNIVERSITY , 编辑部邮箱 ,1994年02期
- 【分类号】TG403
- 【被引频次】1
- 【下载频次】23