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化学氧化对多孔硅表面态和光致发光的影响

The Influence of Chemical Oxidation on Surface State and Photoluminescence of Porous Silicon

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【作者】 李经建刁鹏蔡生民侯永田王昕张树霖

【Author】 Li Jingjian; Diao Peng ;Cai Shengmin(Department of Chemistry, Peking University, Beijing 100871)Hou Yongtian ; Wang Xin; Zhang Shulin(Department of Physics, Peking University Beijing 100871)

【机构】 北京大学化学系!北京1000871北京大学物理系!北京100871

【Abstract】 The changes in photoluminescence and FTIR spectra of porous silicon subjected to oxidation were exdrined. With the increase of okidizing duxation, the relative amount of the Si-H2 surface species on PS decreases even though the photoluminescence intensity increases. the result suggests that it isn’t SiH2 but Si-O and Si-O-Si on theinterface of PS play a key role in enhancing the pllotoluminescence. A complete photoluminescence mechanism should consider the influence of su-rface state of porous silicon based on the quantum codriement effect model.

【基金】 国家自然科学基金
  • 【文献出处】 物理化学学报 ,Acta Physico-chimica Sinica , 编辑部邮箱 ,1994年08期
  • 【分类号】O613.72
  • 【被引频次】11
  • 【下载频次】98
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