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氮分压对PEMSIP法高速钢基体TiN涂层的影响
The Influence of N2 Partial Pressure on TiN Coatings Deposited on the Matrix of HSS by Plasma Enhanced Magnetron Sputtering
【摘要】 用X射线衍射分析研究了氮分区对PEMSIP法TiN涂层相组成的影响,结果表明,随着氮分压增加,涂层相组成朝着富氮相及其含量增加的方向发展,变化趋势为:αTi→(αTi+Ti2N)→(Ti2N+TiN)→TiN。氮分压对涂层硬度的影响主要是由氮分压影响涂层相组成而引起的,其中,由Ti2N和TiN两相组成的膜硬度最高。
【Abstract】 The influence of N2 partial pressure on the component phases of TiN coatings deposited by PEMSIP has been investigated by means of X ray diffraction analysis. The results show that variation of component phases trends towards the formation of nitrides rich in nitrogen and the increase of its content with the increase of N2 partial pressure, the variation tendency is αTi→ (αTi + Ti2N )→(Ti2N +TiN )→TiN. The effect of N2 partial pressure on the microhardness is mainly caused by that the N2 partial pressure effects the component phase of the coatings,while the microhardness of the coating made of two phases like TiN and Ti2N is the hardest.
【Key words】 plasma enhance; magnetron sputtering; TiN; partial pressure; phase analysis;
- 【文献出处】 热加工工艺 ,HOT WORKING TECHNOLOGY , 编辑部邮箱 ,1994年04期
- 【分类号】TG174.442
- 【被引频次】12
- 【下载频次】70