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金属与金属氧化物载体之间的电子相互作用
ELECTRONIC INTERACTION BETWEEN METAL AND METAL-OXIDE SUPPORTS
【摘要】 提出用反应动力学的理论对n型金属氧化物中的各类氧空位的浓度[V0×],[V0+],[V0++]的公式进行推导的方法,以[V0+]>[V0++]的要求为依据,对一些金属氧化物费米能级EF的位置进行了估算.并对在气敏和在催化问题中金属和氧化物载体之间电子相互作用的规律作了讨论.
【Abstract】 The formulas of all kinds of oxygen vacancies concentration [V0×], [V0+],[V0++] in n-Type metal oxide is deduced by the method of theory of reaction kinetics. According to the requirement of [V0+]>[V0++], then estimates the position of Fermi Levels EF in some metal oxides. And makes the discussion about electronic interaction rule between metal and metal-oxide supports in some questions relative to the gas sensor and the catalysis.
【基金】 省自然科学基金
- 【文献出处】 山东工业大学学报 ,JOURNAL OF SHANDONG UNIVERSITY OF TECHNOLOGY , 编辑部邮箱 ,1994年03期
- 【分类号】O481.1
- 【被引频次】4
- 【下载频次】206