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离化原子团束外延ZnSe单晶薄膜
Epitaxy of ZnSe (100) films on GaAs (100) with ionized cluster beam
【摘要】 本文报道了用离化原子团束(ICB)技术在GaAs(100)上外延ZnSe单晶薄膜的研究结果。采用单源喷发并用电子能谱分析了外延薄膜的成分。用互光衍射和RHEED研究了外延ZnSe单晶薄膜结构和外延质量。得到了摆动曲线半高宽为133",并具有原子水平平整程度的ZnSe(100)单晶薄膜。
【Abstract】 Study on epitaxy of ZnSe single crystal films on GaAs (100) with ionized cluster beam deposition technique is reported. A single evaporating source is used in deposition. SEM, XRD and RHEED are used to analyze the epilayer of ZnSe single crystal. A single crystal ZnSe film with atom-flatness is obtained, of which the FWHM of XRD rocking curve is 133 seconds.
- 【文献出处】 清华大学学报(自然科学版) , 编辑部邮箱 ,1994年06期
- 【分类号】O484.5
- 【被引频次】12
- 【下载频次】70