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准分子激光淀积装置真空系统的设计

DESIGN OF THE VACUUM SYSTEM FOR EXCISER LASER ABLATION DEPOSITION

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【作者】 穆仲良; 何永国; 廖信生; 张素明;

【Author】 Mu Zhongliang; He Yongguo;Liao Xinsljeng;Zhang Suming(Naming University instruments Factory, 210008, Naming, PRC)

【机构】 南京大学仪器厂;

【摘要】 设计了一种用准分子激光烧蚀法制备高温超导薄膜与器件的真空系统.它由主室、副室、若干机械手、分子泵等组成.主室允许人们轮流淀积5种不同材料的薄膜并能原位更换掩模,副室可实现等离子体刻蚀或反应离子刻蚀,随后可在不暴露大气的情况下将样品转移至主室。文中描述了关键部件的功能与结构。

【Abstract】 It is presented here a vacuum system of fabricating high temperaturesuperconducting thin films and devices by means of excimer laser ablation technique. Itconsists of a main chamber, a secondary room, a transferring setup, some machine handsand a turbomolecular pump etc.The main chamber permits five different material .films to be deposited alternately andthe masks to be changed in situ or the samples of grown thin films to be transferred to thesecondary room by the transferring setup. The output from a LPX205i pulsed excimer laseroperated at 248urn (KrF) is focused onto a rotating targer through an aperture which is atthe side wall of the chamber, The target is a 30mm disk consisting of the needed depositingmaterial. The rotating axis of the target is set at an angle of 25 centigrade to the beam direchon and the adjustable distance from the center of the sample holder to the target is 3-6cm.The substrates are set on .the sample holder and are heated to -700 centigrade by a quartzlamp. The temperature of the sample holder is monitored by thermocouple attached on theholder and controlled by an automatic programmed temperature controller with a controlprecisin of ±1 centigrade. For the sake of convenience, three different gases can be ledrespectively through the needle valves to the main churn her.In the secondary room, plasma etching or reactive ion etching (RIE) can be realizedand then the samples can be transferred .from this room to the main chamber by the transferring setup without exposing to the atmosphere. A radio frequency source of 40 MHzwith power ̄200W is fed onto a cathode plate of 100mm in diameter and the needed etching samples are set on it.Above this cathode plate, an adjustable distance metal plate parallel to the cathode with the same st.ze is grounded as anode.In order to decrease damageduring plasma etching or reactive ion etching, the cathode plate is watercooled. Argon orreactive gases are introduced to the parallel plate region and are precisely controlled bymeans of needle valves.This paper describes the functions and constructions of some essential parts of the system and points out some preliminary results of the Ba1-xKx.BiO3 superconducting thin filmsusing this apparatus.

【基金】 国家自然科学基金,南京大学固体微结构物理实验室资助
  • 【文献出处】 南京大学学报(自然科学版) ,JOURNAL OF NAIJING UNIVERSITY (NATURAL SCIENCES) , 编辑部邮箱 ,1994年04期
  • 【分类号】TB77
  • 【下载频次】40
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