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Si-C-O-N系统相稳定性和相稳定性图

PHASE STABILITY AND PHASE STABILITY DIAGRAMSOF THE Si-C-O-N SYSTEM

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【作者】 凌志达

【Author】 Ling Zhida(Department of Materials Science,and Engineering,Nanjing Institute of Chmical Technology, )210009,Nanjing,China

【机构】 南京化工学院材料科学与工程系

【摘要】 对Si-C-O-N系统进行了平衡状态下的相稳定性计算,绘制了在1473K和1573K下的Si3N4、SiC、Si2N2O和SiO2相稳定性与N2分压和O2分压的关系图以及N2分压和SiO分区的关系图,Si3N4/Si2N2O/SiC、SiO2/Si2N2O/SiC两个三固相平衡点与N2分压、O2分压和SiO分压以及温度的函数关系日。并以此确定C纤维-SiC纤维转变和C纤维上涂层SiC过程中,为获得稳定SiC相的气体分压。

【Abstract】 The phase stability in equilibrium of the Si-C-O-N system was calculated. The phase stability diagrams for the Si3N4,SiC,Si2N2O and SiO2 at 1473K and 1573K were constructed as a function .of N2 and O2 partial pressures, and of N2 and SiO partial pressures. The diagrams which showthe changes in equilibrium N2,O2 and SiO partial pressures at invariant points (Si3 N 4 /Si2 N2 O /SiC andSiO2,/Si2N2O/SiC) as a fuction of temperatures were also given. From the phase stability calculationand phase stability diagrams, the Partial pressures of the gaseous phases can be defined, which areneeded to obtain a stable SiC phase in the processes of carbon fiber-SiC fiber conversion and coatingSiC on the carbon fibers.

【基金】 国家自然科学基金
  • 【文献出处】 南京化工大学学报 ,JOURNAL OF NANJING UNIVERSITY OF CHEMICAL TECHNOLOGY , 编辑部邮箱 ,1994年01期
  • 【分类号】O743.4
  • 【被引频次】6
  • 【下载频次】113
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