【摘要】 研究了用直流磁控反应性溅射法在Ａｒ＋Ｎ２气氛中沉积（Ｔｉ，Ａｌ）Ｎ膜的工艺。（Ｔｉ，Ａｌ）Ｎ膜具有比ＴｉＮ膜高的耐磨性、硬度和高温抗氧化性。ＡＥＳ深度分析表明，由Ａｌ的选择性氧化形成的Ａｌ２Ｏ３保护层，是（Ｔｉ，Ａｌ）Ｎ膜具有优良高温抗氧化性能的原因．更多还原

【Abstract】 Deposition technique of (Ti,Al)N films sputtered in the Ar+N2 atmosphere using reactive DC magnetron method was studied. The hardness, wear resistance and oxidation resistance of (Ti,Al)N films are superior to those of TiN films. The AES results show that the superior antioxidation characteristic of (Ti,Al) N films at high temperatures results from the formation of protective Al2O3 layers as a result of selective oxidation of Al.更多还原