节点文献
C轴取向ZnO薄膜的研制报告
Preparation of C-Axis Oriented ZnO Thin-film
【摘要】 介绍用改造直流四极磁控溅射台的方法研制Zno薄膜的设备、工艺条件及其对薄膜性能的影响。
【Abstract】 By transforming a four-electrode direct currentsputter bench into a dired current reaction sputter bench.the means of growing ZnO thin-filn has been developed.The equipment and the process conditions which lead tohigh quality Zno thin-film are introduced.
【基金】 国防科工委基金
- 【文献出处】 测控技术 ,Measurement & Control Technology , 编辑部邮箱 ,1994年04期
- 【分类号】TN304
- 【被引频次】2
- 【下载频次】50