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低温载流子冻析效应及其对半导体器件电性能的影响
Carriers Freeze-out Effect and Its Influence on the Semiconductor Device Properties at Low Temperature
【摘要】 结合载流子热激发和场致激发的电离理论,对计算电离杂质浓度的物理模型和计算方法进行了修正,由于考虑了载流子的费米统计分布、载流子对杂质电离能的屏蔽作用、PooleFrenkel强场理论和自加热等物理效应的影响,因而可精确描述低温下载流子冻析效应、浅能级杂质的陷阱行为及其对低温器件交直流性能的影响。
【Abstract】 The physical model and calculation method of ionized impurity concentrations in semiconductors are modified on the basis of carriers thermal emission and field-enhanced ionization and in consideration of Fermi-Dirac statistics,the carriers screening effect on the ionization energy,Poole-Frenkel high electrical field effect and self-heating effect. This kind of model can describe the carriers freeze-out effect, shallow impurity energy trapping behaviour and their influence on the DC and AC properties of semiconductor devices at low temperature.
【关键词】 低温;
杂质电离;
浅能级;
冻析与陷阱效应;
【Key words】 Low Temperature; Impurity Ionization; Shallow Impurity Energy; Carriers Freeze-out and Trapping Effect;
【Key words】 Low Temperature; Impurity Ionization; Shallow Impurity Energy; Carriers Freeze-out and Trapping Effect;
【基金】 博士点基金
- 【文献出处】 固体电子学研究与进展 ,RESEARCH & PROGRESS OF SOLIA STATE ELECTRONICS , 编辑部邮箱 ,1994年03期
- 【分类号】O473
- 【被引频次】7
- 【下载频次】309