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环氧树脂上激光诱导局部化学沉铜
Laser-induced selective deposition of copper on epoxy resin
【摘要】 用激光诱导化学沉积方法在非导体环氧树脂基体上实现微区局部、快速化学沉铜,并用卢瑟福背散射和扫描电镜方法对镀层的形貌、性质进行了观测和分析.激光的输出功率密度及照射时间决定了镀斑的面积和厚度.所得镀层比传统方法所得的化学镀层更致密.同时,由于激光照射引起的短时局部高温,使界面的金属原子向光照区基体内部扩散,得到的铜镀层与基体有较好的结合力.
【Abstract】 Using laser induced chemical deposition methods,a local micro - region quick chemical deposition of copper on a nonconductor epoxy resin substrate has been realized. The feature and property of the deposit obtained were studied by RBS and SEM. The laser power density and the irradiating time are responsible for the size and thickness of the deposit. Thd local high temperature makes the copper atoms diffuse into the substrate, resulting a better adhesion between the copper deposit and the substrate.
【关键词】 铜;
激光沉积;
环氧树脂;
激光诱导化学沉积;
【Key words】 copper; laser deposition; epoxy resins; laser induced chemical deposition;
【Key words】 copper; laser deposition; epoxy resins; laser induced chemical deposition;
- 【文献出处】 复旦学报(自然科学版) , 编辑部邮箱 ,1994年01期
- 【分类号】TQ153.14
- 【被引频次】19
- 【下载频次】145