节点文献
离子参数对物理气相沉积薄膜微结构的影响
THE EFFECT OF ION PARAMETERS ON MICROSTRUCTURE AND THEIR PROPERTIES OF PVD HARD COATINGS
【摘要】 在追述以往的判断薄膜微结构的结构区模型(structurezonemodels)的基础上,整理和介绍了国外最近提出的结构区模型。它是以离子复合参数E_p(由到达的离子带给凝聚粒子的平均能量eV/atom)为参变量,衡量该参数对薄膜微结构及其特性的影响,对今后设计PVD设备和更好地掌握工艺条件,将会是有益的。
【Abstract】 Physical vapor deposition(PVD)methods have found widespread appli-cation the deposition of hard coatings. In order to compare potential and limi-tations of the PVD methods, a good knowledge of the physical processes offilm growth, formation of various film microstructures, and the resultingproperties iS necessary. Here the latest advances in understanding the ef-fect of physical film growth parameter on the microstructure of growingfilms are reviewed.Examples of sputtered TiN film microstructure are given.A critical review of the structure zone models is presented.
- 【文献出处】 电工电能新技术 ,ADVANCED TECHNOLOGY OF ELECTRICAL ENGINEERING AND ENERGY , 编辑部邮箱 ,1994年04期
- 【分类号】TM215.3
- 【被引频次】10
- 【下载频次】95