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电沉积Ni—Ce—S非晶态合金
Electrodeosition of Ni-Ce-S Amorphous Alloy
【摘要】 研究了镀液组成和工艺条件对Ni—Ce—S非晶态合金沉积层的影响,结果表明,镀层中的S含量随电流密度、镀液的pH值和硫代硫酸钠浓度的变化而变化,但与镀液中的氯化钾浓度无关;X射线衍射图说明,当镀层中的S含量超过30%时,镀层为非晶态结构;扫描电子显微镜表明,当镀层中S含量增加时,镀层的微裂纹减少且变细,当镀层中Ce含量增加时,晶粒会细化。
【Abstract】 Effects of bath composition and deposition conditions on components of the Ni-Ce-S amorphous deposit are studied. Sulfur content in the film obtained changes with the changes of current density applied, bath PH and sodium thiosulfate concentration, but has no relation to the concentration of cerium tricbloride. X-ray diffxaction patterns show that the films with sulfur content over 30% appears in amorphous structure. SEM examination indicates that as sulfur content increases, microcracks in the film become finer and less, and as cerium content increases, the grains will be finer as well.
- 【文献出处】 电镀与涂饰 ,ELECTROPLATING & FINISHING , 编辑部邮箱 ,1994年04期
- 【分类号】TQ153
- 【被引频次】21
- 【下载频次】70