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用场发射显微镜研究氧在W(100)面和W(111)面上的吸附和解吸过程

A STUDY ON THE ADSORPTION AND DESORPTION OF OXYGEN ON THE W(100) AND THE W(111) PLANES BY USING FIELD EMISSION MICROSCOPE

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【作者】 巩运明冷荣华

【Author】 Gong Yunming, Leng Ronghua(Dept. of Radio - Electronics, Peking University, Beijing)

【机构】 北京大学无线电系北京大学无线电系 北京 100871北京 100871

【摘要】 用探孔场发射显微镜研究了氧在W(100)面和W(111)面上的吸附和解吸过程。在3.8×10-6Pa的氧压和291K的温度下吸附氧,W(100)面和W(111)面上功函数的最大增量分别为△φmax100=+1.6eV和△φmax111=+1.1eV。当吸附氧的场发射体从291K到1800K逐渐升温时,W(100)面和W(111)面的功函数的最小增量分别为△φmin100=-0.3eV(在1750K)和△φmin111=-0.5eV(在1700K)。对这两个晶面的实验结果进行了比较,并对其功函数增量最小值的产生给出了物理解释。

【Abstract】 Adsorption and desorption of oxygen on the W (100) and the W(111) planes have been studied by using a prob - hole field emission microscope. Oxygen is dosed with a pressure of 3. 8×10-6Pa and at 291K. The maximum increments of work functions in the W (100) and the W (111) planes are respectively △Φmax100=+1.6eV and △Φmax111=+1.1eV. When an emitter covered with adsorbed oxygen is gradually heated from 291K to 1800K,the minimum increments of work functions on the W (100) and W (111) planes are respectively △Φmin100=-0. 3eV at 1750K and △Φmin100=-0.5eV at 1700K. The experimental results on the W(100) and W (111) planes are compared. And the physical explanation of the minimum work - function increments is given.

  • 【文献出处】 真空科学与技术 ,Vacuum Science and Technology , 编辑部邮箱 ,1993年05期
  • 【下载频次】24
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