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Ar~+离子注入对Ge/GaAs(100)异质结能带偏离影响的XPS研究
An XPS Study on the Effect of Ar~+ Implanting on Ge/GaAs (100) Heterojunction Band Offsets
【摘要】 用X光电子能谱(XPS)方法研究了界面特性和Ge/GaAs(100)异质结的能带偏离关系。实验表明,当在清洁的GaAs(100)表面生长Ge异质结时,其价带偏离(△E_v)与界面特性无关,而在Ar离子注入的GaAs(100)表面上生长的Ge异质结,其价带偏离与Ar~+离子的浓度分布有关。
【Abstract】 The relationship between the interface properties and the band offsets of the Ge/GaAs (100) heterojunction is studied with X-ray photoelectron spectroscopy (XPS). The experimental results show that the valence-band offsets (△E_v) are independent on the interface properties when the Ge overlayer deposites on the clean CaAs(100) surface, and the valence-band offsets(△E_v) are related to the distribution of Ar~+ concentration when the Ge overlayer is evaporated on the Ar~+-implanted GaAs (100) surface.
【基金】 高等学校博士点专项基金
- 【文献出处】 中国科学技术大学学报 ,Journal of University of Science and Technology of China , 编辑部邮箱 ,1993年04期
- 【分类号】O471.5
- 【下载频次】65