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离子束增强沉积Si、Si-Y薄膜提高304不锈钢抗氧化性的研究

SYNTHESIS OF Si AND Si-Y THIN FILMS BY IBED TO IMPROVE THE OXIDATION RESISTANCE OF 304 STAINLESS STEEL

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【作者】 李化龙黄元伟柳襄怀

【Author】 Li Hualong,Huang Yuanwei and Liu Xianghuai (Shanghai Institute of Metallurgy,Chinese Academy of Sciences)

【机构】 中国科学院上海冶金研究所

【摘要】 用离子束增强沉积的方法,在304不锈钢表面沉积Si,Si-Y薄膜,并研究其对不锈钢抗氧化性的影响。通过950℃,1050℃恒温氧化和950℃循环氧化发现,沉积了Si薄膜的试样,由于Si氧化物的生成显著地提高了不锈钢的抗氧化性;而Y的加入不但促进了SiO2的生长,抑制了氧化膜的生长应力,而且提高了SiO2膜抗热应力的能力。用SEM、AES、EPMA及X射线衍射等手段,分析了氧化膜的结构、形貌和组成,并根据实验结果讨论了Si和Y的作用机制。

【Abstract】 Si and Si-Y thin films were synthesized on the surface of 304 stainless steel by ion-beam-enhanced-deposition (IBED), and their effects on the oxidation-re-sistance of the steel were studied. During isothermal oxidation at950℃, 1050℃ and cycling oxidation at 950℃ in air,it was found that SiO2 or Fe2SiO4 protective scale was formed on the surface of the specimen with Si film, hence,improved significantly the oxidation resistance of the substrate. The addition of element Y to Si thin film not only promoted the growth and nucleation of SiO2 and reduced defect densities and growth stresses,but also improved the resistance of the SiO2 scale against thermal stresses. EPMA, SEM, ASE and XRD were employed to characterize element distribution, morphology and phases of oxide products. On the basis of these results,the beneficial effects of Si and Y were discussed.

  • 【文献出处】 中国腐蚀与防护学报 ,Journal of Chinese Society for Corrosion and Protection , 编辑部邮箱 ,1993年02期
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