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Ti/Mo的离子束混合研究

ION BEAM MIXING OF Ti/Mo BILAYERS AND MULTILAYERS

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【作者】 张建伟王佩璇张国光

【Author】 ZHANG JIANWEI;WANG PEIXUAN;ZHANG GUOGUANG Department of Materials Physics, University of Science and Technology, Beijing, 100083

【机构】 北京科技大学材料物理系北京科技大学材料物理系 100083100083100083

【摘要】 采用Xe+(300 keV)和Ar+(90—120 keV)离子束,在室温下轰击双层型及多层膜样品,离子注量范围为1×1015-1×1017cm-2。用俄歇电子能谱,X射线光电子能谱及卢瑟福背散射法分析成分的深度分布,并用透射电镜观察多层膜的结构。结果表明,体系中主要发生级联混合。对多层膜有Q∝φ1/2。而双层样品,则为Dt∝φ1/2。用Xe+混合时,多层膜中部的混合显著多于两侧,与TRIM计算的能量沉积密度分布相符。多层膜混合后形成体心立方的β-Ti-Mo亚稳固溶体。碳、氧杂质对混合有显著的抑制作用,并在混合过程中重新分布。

【Abstract】 Both bilayer and multilayer samples are bombarded at room temperature with Xe+ (300 keV)or Ar+ (90--120 keV) for the doses of 1×1015--1×1017cm-2. AES, XPS and RBS are used forthe depth profiling of compositions. TEM observations are also carried out on multilayer samples.It is found that ion beam mixing occurres in cascade regime Q∝Φ1/2 for the multilayers and effec-tive Dt∝Φ1/2 for the bilayers, respectively. Nonuniform mixing is observed in multilayers, partic-ularly with Xe+ bombardment, which is consistent with the calculations of the deposited energydensity distribution. Metastable β-Ti-Mo solid solution of bcc structure is formed after mixing.Impurities such as C, O significantly suppress the mixing and are also redistributed buring ionbombardment.

【关键词】 Ti-Mo体系离子注入离子束混合薄膜
【Key words】 Ti/Mo systemIon implantationIon beam mixingThin film
  • 【文献出处】 原子能科学技术 ,Atomic Energy Science and Technology , 编辑部邮箱 ,1993年06期
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