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SnO2膜的 CSD 法制备及其结构
SnO2 Film Prepared by CSD Technique and Its Structure
【摘要】 本文介绍了一种制备 SnO2膜的新方法—化学超声喷雾淀积(CSD)技术.为制得高质量的 SnO2膜,我们对各种淀积参数进行了详细的研究.通过 X 光衍射仪、扫描电子显微镜的分析和膜厚的测量,研究了 SnO2膜的形貌和晶体结构,结果表明喷嘴到衬底的距离、淀积时间和喷雾的雾量大小对膜的淀积影响最大,衬底位置及热处理的时间也都会影响膜的粒径、均匀性和致密性.此外,结果还表明淀积时间较短的 SnO2膜,经过热处理后,晶形有明显的改善.
【Abstract】 This paper reports the study on the preparation of SnO2 film by using a new method Ul-trasonic Chemical Spray Deposition(CSD)technique.The various deposition parameters arecarefully investigated to get the film of high quality.By means of X-ray diffraction,scanningelectron microscopy and film thickness measurement,the morphology and crystal structure ofSnO2 film are studied.The results indicate that such factors as the distance between substrateand nozzle,deposition time and the vapor volume sprayed are most important.The substratetemperature,substrate position and the sintering time all influence the film’s grain size,ho-mogeneity and its densification.Also,the results indicate that the crystallization of SnO2 filmwith short time of deposition has been improved distinctly after sintering.
- 【文献出处】 无机材料学报 ,Journal of Inorganic Materials , 编辑部邮箱 ,1993年02期
- 【被引频次】2
- 【下载频次】37