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微波 PCVD 法生长金刚石薄膜
Growth of Diamond Films by Microwave plasma CVD
【摘要】 本文论述了微波等离子体化学汽相沉积(PCVD)法生长的金刚石薄膜的结构表征、影响因素和生长规律。和热丝 CVD 一样,用微波 PCVD 法也能得到结构与天然金刚石十分吻合的多晶薄膜。薄膜的生长除了受碳源浓度、基片温度的影响外,还受到气体压力、基片电学性质和放置方式等因素的强烈影响。拉曼谱上1430cm-1峰的起因与溅射现象有关。
【Abstract】 The structure characterization,technological parameters,andgrowth peculiarites of diamond films by microwave plasma CVD were discussedin this paper.polycrystaline films whose structures were identical to those ofnatural diamond could be obtained by microwave plasma CVD as well as byhot-filament CVD.The growth was strongly influenced by gas pressures,ele-ctrieal properties of substrates and ways ef placing them besides carbon conce-ntration and substrate temperature.The Raman peak at 1430 cm-1 might berelated with sputtering phenomena.
【关键词】 金刚石薄膜;
微波 PCVD;
拉曼光谱;
溅射;
【Key words】 diamond films; microwave plasma CVD; Raman spectra; sputtering;
【Key words】 diamond films; microwave plasma CVD; Raman spectra; sputtering;
【基金】 国家863高科技;上海市自然科学基金
- 【文献出处】 人工晶体学报 ,Journal of Synthetic Crystals , 编辑部邮箱 ,1993年01期
- 【被引频次】1
- 【下载频次】79