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垂直浸渍液相外延Hg1-xCdxTe的生长及性能

Growth and Characterization of Hg1-xCdxTe by means of Vertical Dipping Liquid-Phase Epitaxy

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【作者】 陈新强褚君浩张恕明张小平俞振中周捷邢思皓蔡琤季华美

【Author】 Chen Xin-qiang Chu Jun-hao Zhang Shu-ming Zhang Xiao-ping Yu Zhen-zhong Zhou Jie Xing Si-hao Cai Zeng Ji Hua-mei (Shanghai Institute of Technical Physics Academia, Sinica, Shanghai, 200083, China)

【机构】 中国科学院上海技术物理研究所中国科学院上海技术物理研究所 上海 200083上海 200083

【摘要】 本文报导采用汞回流垂直浸渍液相外延方法,在CdTe或CdZnTe(111)面的衬底上生长Hg1-xCdxTe单晶,其厚度为20μm,面积为1.5×2cm2,组分x从0.18到0.7,组分均匀性Δx≈0.001。样品经热处理以后,x=0.2的n型样品电子浓度n≈1×1015cm-3,电子迁移率μ≈105cm2/v·s,p型样品空穴浓度p≈2×1016cm-3,空穴迁移率μ≈300cm2/v·s,双晶衍射显示样品的半峰宽为90arc sec,X光貌相分析表明外延层晶体结构优良。样品的红外光谱测量,电学参数测量以及载流子寿命测量表明样品具有优良的光电性质。

【Abstract】 The growth of liquid-phase -epitaxial (LPE) layer Hg1-xCdxTe on CdTe or CdZnTe(111)substrate by means of vertical dipping system has been reported in this paper. The samples of LPE Hg1-xCdxTe with composition, (x, from 0.18 to 0.70)and composition uniformity of △x≈0.001 have been grown. The thickness and the area of LPE sample are about 20μm and 1.5×2cm2 respe- ctively. After annealing for n-type Hg1-xCdxTe samples with x=0.2, the electron concentration and mobility are about n≈1×1015cm-3 and μ≈105cm2/v·s at 77K respectively, and the hole concentration and mobility are about p≈2× 1016cm-3, μ≈300cm2/v·s at 77K respectively for p-type samples. The half peak wicth of 90" at X-ray double crystal diffraction measurements was determined for the LPE layer. It shows that the good quality of the LPE samples has been demonstrated by means of the measurements of X-ray topograph analysis, infrared spectroscopy, electrical properties, carrier life-time etc.

  • 【文献出处】 功能材料 ,Journal of Functional Materials , 编辑部邮箱 ,1993年03期
  • 【下载频次】44
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