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自然氧化和电子辐照对多孔硅结构有序度的影响

Influence of Spontaneous Oxidation and Electron Beam Irradiation on Structure Ordering of Porous Silicon

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【作者】 官浩阎锋鲍希茂杨海强吴晓薇洪建明

【Author】 Guan Hao/Department of Physics & Laboratory of Solid State Microstructure Nanjing University, Nanjing 210008Yan Feng/Department of Physics & Laboratory of Solid State Microstructure Nanjing University, Nanjing 210008Bao Ximao/Department of Physics & Laboratory of Solid State Microstructure Nanjing University, Nanjing 210008Yang Haiqiang/Department of Physics & Laboratory of Solid State Microstructure Nanjing University, Nanjing 210008Wu Xiaowei/Department of Physics & Laboratory of Solid State Microstructure Nanjing University, Nanjing 210008Hong Jianming/Department of Physics & Laboratory of Solid State Microstructure Nanjing University, Nanjing 210008

【机构】 南京大学物理系和固体微结构实验室南京大学物理系和固体微结构实验室 南京 210008南京 210008南京 210008

【摘要】 多孔硅在空气中自然氧化形成Si—O—Si键,引起晶格畸变,导致有序度下降,氧化层用HF去除,有序度可恢复。大束流电子束辐照直接引起晶粒无序化,其有序度不能在HF浸泡中恢复。

【Abstract】 In air, the porous silicon is spontaneously oxidized and Si-O-Si bonds are formed,which introduced the distortion of the lattice and caused the disordering in the crystallites.When the native oxide is removed by I-IF etching, the ordering can be restored. But under irradiationof the electron beam, the crystallites disorder gradually and the ordering can not berestored by the brief etch in HF.

【基金】 国家自然科学基金
  • 【文献出处】 半导体学报 ,Chinese Journal of Semiconductors , 编辑部邮箱 ,1993年08期
  • 【被引频次】1
  • 【下载频次】25
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