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气相色谱法测定薄膜中氢含量
Determination of Hydrogen Content in Film by Gas Chromatographic Method
【摘要】 本文介绍用气相色谱法测定氮化硅膜,非晶硅膜,氮化硼膜中的总氢含量及不同温度下氢的热释放率。该方法灵敏度高,简便准确可靠,样品量少,并且不需作特殊处理,可进行定量测定。
【Abstract】 We carried out quantitative determination of the total hydrogen content and the hydrogeneffusion rate at different temperatures in silicon hi(?)ride film, a-Si film and boron nitride filmby gas chromatography with special heating devices. The method is simple, sensitive, accurateand practical.
- 【文献出处】 半导体学报 ,Chinese Journal of Semiconductors , 编辑部邮箱 ,1993年03期
- 【被引频次】2
- 【下载频次】41