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衬底温度对热壁外延ZnSe薄膜质量的影响

EFFECT OF SUBSTRATE TEMPERATURE ON ZnSe FILMS GROWN BY HOT WALL EPITAXY

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【作者】 吕宏强王杰沈军刘咏王迅王昌平王建宝李晨沈孝良

【Author】 Lu HONG-QIANG WANG JIe SHEN JUN LIU YONG WANG XUNSurface Physics Laboratory, Fudan University, Shanghai 200433WANG CHANG-PING WANG JIAN-BAO LI CHENDepartment of Physics, Fudan University, Shanghai 200433SHEN XIAO-LIANGCenter of Analysis and Measurement, Fudan University, Shanghai 200433

【机构】 复旦大学应用表面物理国家重点实验室复旦大学物理系复旦大学分析测试中心 上海 200433上海 200433上海 200433

【摘要】 用热壁外延法在不同衬底温度条件下生长一系列ZnSe薄膜,并通过X射线衍射、喇曼散射以及光致发光技术对ZnSe薄膜质量作了研究。实验结果表明,随着衬底温度下降,ZnSe薄膜质量逐渐变差;当衬底温度低于300℃时,(100)ZnSe薄膜中有(111)孪晶出现;但同时发现衬底温度大于375℃时,衬底Ga原子对ZnSe外延层扩散严重。

【Abstract】 In this paper, we report the results of the growth of a series of ZnSe films on (100) GaAs at different substrate temperatures by hot wall epitaxy. The quality of ZnSe films has been studied by X-ray diffraction, Raman scattering and photoluminescence. The results show that: 1) We have got (100)-oriented single crystal fillms, but the quality becomes worse when lowering the substrate temperature. When the substrate temperature is below 300℃ there appears the (111)-oriented twins in the (100ZnSe. 2) When the substrate temperature is 350℃, Ga atom diffusion from the substrate to the ZnSe epitaxial layer is serious.

  • 【文献出处】 物理学报 ,Acta Physica Sinica , 编辑部邮箱 ,1992年08期
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