节点文献
准分子激光光刻的发展状况
Deveiopment on excimer laser lithography
【摘要】 本文综述了准分子激光光刻的发展,着重讨论准分子激光光刻的优点及其在提高分辨率方面的进展,并讨论了今后的动向。
【Abstract】 The developments of excimer laser lithography have been reviewed, the emphasis of discussion is placed on the advantage of excimer laser lithography, the development on resolution increase and the glorious future has been discussed as well.
- 【文献出处】 激光杂志 ,Laser Journal , 编辑部邮箱 ,1992年03期
- 【被引频次】2
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